製程技術開發
先進技術開發
ITO 製程技術
ITO薄膜品質 (1)一般規格
Resistance | Thickness | Etching Rate | Transmittance | CIE color |
(Ω/□) | (nm) | (nm/sec) | at 550nm(%) | |
≦ 15 | 150 ± 20 | ≧0.3 | ≧90 | — |
≦10 | 200 ± 20 | ≧0.3 | ≧85 | — |
≦ 8 | 300 ± 20 | ≧0.3 | ≧90 | — |
200 ± 50. | 10-20 | ≧0.1 | ≧89 | — |
300 ± 50 | 15-20 | ≧0.1 | ≧89 | — |
400 ± 50 | 10-20 | ≧0.1 | ≧90 | — |
500 ± 100 | 10-20 | ≧0.1 | ≧90 | — |
650 ± 100 | 10-20 | ≧0.1 | ≧90 | — |
ITO 製程技術
ITO薄膜品質 (2)高穿透率規格
Resistance | Thickness | Etching Rate | Transmittance | CIE color |
(Ω/□) | (nm) | (nm/sec) | at 550nm(%) | |
300 ± 50 | 15-25 | ≧0.1 | ≧92 | b*≦2 |
400 ± 50 | 10-20 | ≧0.1 | ≧93 | b*≦2 |
500 ± 100 | 10-20 | ≧0.1 | ≧93 | b*≦2 |
650 ± 100 | 10-20 | ≧0.1 | ≧93 | b*≦2 |
AZO 製程技術
AZO薄膜品質
Resistance | Thickness | Etching Rate | Transmittance | CIE color |
(Ω/□) | (nm) | (nm/sec) | at 550nm(%) | |
150± 50 | 120± 20 | — | ≧89 | — |
<20 | 475± 25 | — | ≧89 | — |
<10 | 750 ±25 | — | ≧90 | — |
